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     ִ Cleaning忡 ǸŵǴ ڵȭ ô ̸, Loading/Unloading Return Conveyor ۾ Mass Production Ǿ, ʺڵ Button Ͽ ֽϴ
    
Ư : Belt (Particle Generation) Ͽ κϿ ۹
                         ôμ
Semiconductor Fab. 䱸Ǵ(Class 10) ȯ濡
                        ϸ,
Production Capa. 䱸 ִ
 ֻ Customized
                        Դϴ.
     о : HDD(Cover, Base, HSA), Disk Media, Wafer Box&Cassette, Reticle Box, FOUP.
     : Ultrasonic Tank Wash Ultrasonic Tank Rinse DIW Rinse CDA/N2 Dry
                         Vacuum Dry
     : 񱸼 2~3 Wet Station 3~5 Dry Station Ǿ ֽϴ.
                         ⺻
Tank Size
 25 x 36 x 25 61 x 92 x 51 ֽϴ.
                         (
Custom
ized tank sizes )  
                         3
Process Station Ϲ
  ô
                        ϸ,
Rinse Tankϳ ߰  Ǹ Micro
Level ô մϴ.  
                         5(
wash-wash-rinse-rinse-dry) Solvent
Բ Ͽ System
                         
ֽϴ
                         
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S 翡 ġ

         

Progressive high-frequency ultrasonic cleaning systems are proving extremely effective in submicron particle removal. Sample 8-station Precision Ultrasonic Cleaning System

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(443-390)   ⵵     뱸  ŵ   486    п̾II   103 506ȣ,      TEL : 031-695-6245,     FAX : 031-695-6246  
  info@semion.co.kr

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